Potzick, J. E.: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

1

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Overlay measurements and standards

Silver, Richard M., Potzick, James E., Larrabee, Robert D., Bennett, Marylyn H.

Year:

1995

Language:

english

File:

PDF, 519 KB

english, 1995

2

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - High-accuracy overlay measurements

Silver, Richard M., Potzick, James E., Scire, Fredric, Larrabee, Robert D., Jones, Susan K.

Year:

1996

Language:

english

File:

PDF, 575 KB

english, 1996

3

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Method to characterize overlay tool misalignments and distortions

Silver, Richard M., Potzick, James E., Scire, Fredric, Evans, Christopher J., McGlauflin, M., Kornegay, Edward, Larrabee, Robert D., Jones, Susan K.

Year:

1997

Language:

english

File:

PDF, 1.14 MB

english, 1997

4

Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks

Smith, Stewart, Tsiamis, Andreas, McCallum, Martin, Hourd, Andrew C., Stevenson, J. T. M., Walton, Anthony J., Dixson, Ronald G., Allen, Richard A., Potzick, James E., Cresswell, Michael W., Orji, Ndu

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2009

Language:

english

File:

PDF, 896 KB

english, 2009

5

Long wavelength acoustic flowmeter

Potzick, James E.

Journal:

The Journal of the Acoustical Society of America

Year:

1984

Language:

english

File:

PDF, 104 KB

english, 1984

6

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Results of an international photomask linewidth comparison of NIST and PTB

Bodermann, B., Zurbrick, Larry S., Montgomery, M. Warren, Bergmann, D., Buhr, E., Hässler-Grohne, W., Bosse, H., Potzick, J., Dixson, R., Quintanilha, R., Stocker, M., Vladar, A., Orji, N. G.

Year:

2009

Language:

english

File:

PDF, 1.38 MB

english, 2009

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - TSOM method for semiconductor metrology

Attota, Ravikiran, Dixson, Ronald G., Kramar, John A., Potzick, James E., Vladár, András E., Bunday, Benjamin, Novak, Erik, Rudack, Andrew, Raymond, Christopher J.

Year:

2011

Language:

english

File:

PDF, 3.17 MB

english, 2011

8

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Practical photomask linewidth measurements

Potzick, James E., Arnold, William H.

Year:

1990

Language:

english

File:

PDF, 212 KB

english, 1990

9

SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Microlithography and Metrology in Micromachining II - New certified length scale for microfabrication metrology

Potzick, James E., Postek, Jr., Michael T., Friedrich, Craig R.

Year:

1996

Language:

english

File:

PDF, 527 KB

english, 1996

10

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Photomask metrology using a 193nm scatterfield microscope

Quintanilha, R., Zurbrick, Larry S., Montgomery, M. Warren, Barnes, B. M., Sohn, Y., Howard, L. P., Silver, R. M., Potzick, J. E., Stocker, M. T.

Year:

2009

Language:

english

File:

PDF, 1.82 MB

english, 2009

11

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Updated NIST photomask linewidth standard

Potzick, James E., Herr, Daniel J., Pedulla, J. M., Stocker, Michael T.

Year:

2003

Language:

english

File:

PDF, 196 KB

english, 2003

12

SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - Photomask metrology in the era of neolithography

Potzick, James E., Reynolds, James A., Grenon, Brian J.

Year:

1998

Language:

english

File:

PDF, 872 KB

english, 1998

13

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - New NIST Photomask Linewidth Standard

Potzick, James E., Pedulla, J. Marc, Stocker, Michael T., Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 160 KB

english, 2002

14

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Integrated Circuit Metrology, Inspection, and Process Control VII - Comparisons of measured linewidths of submicrometer lines using optical, electrical, and SEM metrologies

Allen, Richard A., Troccolo, Patrick M., Owen III, James C., Potzick, James E., Linholm, Loren W., Postek, Michael T.

Year:

1993

Language:

english

File:

PDF, 367 KB

english, 1993

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Metrology and process control: dealing with measurement uncertainty

Potzick, James, Raymond, Christopher J.

Year:

2010

Language:

english

File:

PDF, 2.02 MB

english, 2010

16

Boycott anti‐ERA states?

Moellering, W., Potzick, James, Hill, Benny J.

Journal:

Year:

1979

Language:

english

File:

PDF, 532 KB

english, 1979

17

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Photomask applications of traceable atomic force microscope dimensional metrology at NIST

Dixson, Ronald, Naber, Robert J., Kawahira, Hiroichi, Orji, Ndubuisi G., Potzick, James, Fu, Joseph, Allen, Richard A., Cresswell, Michael, Smith, Stewart, Walton, Anthony J., Tsiamis, Andreas

Year:

2007

Language:

english

File:

PDF, 167 KB

english, 2007

18

A Method for Determining the Dynamic Response of an Elastic Load Cell Element

Journal:

Review of Scientific Instruments

Year:

1970

Language:

english

File:

PDF, 636 KB

english, 1970

19

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Problem with submicrometer-linewidth standards and a proposed solution

Potzick, James E., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 138 KB

english, 2001

20

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Accuracy in optical image modeling

Potzick, James, Archie, Chas N., Marx, Egon, Davidson, Mark

Year:

2007

Language:

english

File:

PDF, 1011 KB

english, 2007

21

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Accuracy and traceability in dimensional measurements

Potzick, James E., Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 726 KB

english, 1998

22

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Re-calibration of the NIST SRM 2059 master standard using traceable atomic force microscope metrology

Dixson, Ronald, Kawahira, Hiroichi, Zurbrick, Larry S., Potzick, James, Orji, Ndubuisi G.

Year:

2008

Language:

english

File:

PDF, 313 KB

english, 2008

23

Performance evaluation of the NBS long-wave acoustic flowmeter

Year:

1984

Language:

english

File:

PDF, 319 KB

english, 1984

24

Voltage-controlled phase shifter for measuring transfer function in the presence of noise

Potzick, James E.

Journal:

Review of Scientific Instruments

Year:

1981

Language:

english

File:

PDF, 709 KB

english, 1981

25

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Neolithography Consortium: a progress report

Potzick, James E., Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 58 KB

english, 2001

26

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Integrated Circuit Metrology, Inspection, and Process Control III - Automated Calibration Of Optical Photomask Linewidth Standards At The National Institute Of Standards And Technology

Potzick, James, Monahan, Kevin M.

Year:

1989

Language:

english

File:

PDF, 688 KB

english, 1989

27

Lissajous Figures by Analog Computer

Journal:

Year:

1965

Language:

english

File:

PDF, 399 KB

english, 1965

28

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - The Neolithography Consortium

Potzick, James E., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 1.84 MB

english, 2000

29

SPIE Proceedings [SPIE Optics & Photonics - San Diego, CA (Sunday 13 August 2006)] Novel Optical Systems Design and Optimization IX - Optical illumination and critical dimension analysis using the through-focus focus metric method

Attota, Ravikiran, Silver, Richard M., Potzick, James, Sasian, José M., Turner, Mary G.

Year:

2006

Language:

english

File:

PDF, 961 KB

english, 2006

30

Synchronous marker for measuring phase in the presence of noise

Robertson, Baldwin, Potzick, James E.

Journal:

Review of Scientific Instruments

Year:

1977

Language:

english

File:

PDF, 610 KB

english, 1977

31

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Improving the uncertainty of photomask linewidth measurements

Pedulla, J. M., Silver, Richard M., Potzick, James, Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 244 KB

english, 2004

32

SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Improved photomask metrology through exposure emulation

Potzick, James E., Yoshihara, Hideo

Year:

1995

Language:

english

File:

PDF, 466 KB

english, 1995

33

[IEEE 2005 IEEE Antennas and Propagation Society International Symposium - Washington, DC, USA (03-08 July 2005)] 2005 IEEE Antennas and Propagation Society International Symposium - Simulation of Optical Microscope Images for Photomask Feature Size Measurements

Marx, E., Potzick, J.

Year:

2005

Language:

english

File:

PDF, 374 KB

english, 2005

34

SPIE Proceedings [SPIE 14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 14 September 1994)] 14th Annual BACUS Symposium on Photomask Technology and Management - Improving photomask linewidth measurement accuracy via emulated stepper aerial image measurement

Potzick, James E., Brodsky, William L., Shelden, Gilbert V.

Year:

1994

Language:

english

File:

PDF, 286 KB

english, 1994

35

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - International comparison of photomask linewidth standards: United States (NIST) and United Kingdom (NPL)

Potzick, James E., Nunn, John W., Jones, Susan K.

Year:

1996

Language:

english

File:

PDF, 253 KB

english, 1996

36

Noise averaging and measurement resolution (or “A little noise is a good thing”)

Journal:

Review of Scientific Instruments

Year:

1999

Language:

english

File:

PDF, 356 KB

english, 1999

37

Thoracic Epidural Vs Balanced Anesthesia in Morbid Obesity

GELMAN, S., LAWS, H. L., POTZICK, J., STRONG, S., SMITH, L., ERDEMIR, H.

Journal:

Survey of Anesthesiology

Year:

1981

File:

PDF, 160 KB

1981

38

Thoracic Epidural vs Balanced Anesthesia in Morbid Obesity

Gelman, Simon, Laws, Henry L., Potzick, Joseph, Strong, Sandra, Smith, Lloyd, Erdemir, Hamdi

Journal:

Anesthesia & Analgesia

Year:

1980

Language:

english

File:

PDF, 638 KB

english, 1980

39

Parametric uncertainty in nanoscale optical dimensional measurements

Potzick, James, Marx, Egon

Journal:

Year:

2012

Language:

english

File:

PDF, 1.18 MB

english, 2012

40

THORACIC EPIDURAL ANALGESIA IN MORBID OBESITY

Gelman, S., Laws, H. L., Potzick, J., Strong, S., Linnan, M., Erdemir, H.

Journal:

Year:

1979

File:

PDF, 106 KB

1979

41

Flow measured acoustically

Potzick, James, Robertson, Baldwin

Journal:

Physics Bulletin

Year:

1982

Language:

english

File:

PDF, 190 KB

english, 1982

42

[IEEE 2008 IEEE International Conference on Microelectronic Test Structure (ICMTS) - Edinburgh, UK (2008.03.24-2008.03.27)] 2008 IEEE International Conference on Microelectronic Test Structures - Comparison of measurement techniques for advanced photomask metrology

Smith, S., Tsiamis, A., McCallum, M., Hourd, A. C., Stevenson, J. T. M., Walton, A. J., Dixson, R. G., Allen, R. A., Potzick, J. E., Cresswell, M. W., Orji, N. G.

Year:

2008

Language:

english

File:

PDF, 172 KB

english, 2008

43

Acoustic mass flowmeter for automotive exhaust measurements

Potzick, James, Robertson, Baldwin

Journal:

The Journal of the Acoustical Society of America

Year:

1976

Language:

english

File:

PDF, 176 KB

english, 1976

44

Thermal regimes, mantle diapirs and crustal stresses of continental rifts

R.J. Bridwell, C. Potzick

Journal:

Year:

1981

Language:

english

File:

PDF, 1.37 MB

english, 1981

45

Accuracy of Optical Dimensional Metrology at the Nano-scale

Journal:

Microscopy and Microanalysis

Year:

2008

Language:

english

File:

PDF, 254 KB

english, 2008

46

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - International photomask linewidth comparison by NIST and PTB

Potzick, J., Kawahira, Hiroichi, Zurbrick, Larry S., Dixson, R., Quintanilha, R., Stocker, M., Vladar, A., Buhr, E., Häßler-Grohne, W., Bodermann, B., Frase, C. G., Bosse, H.

Year:

2008

Language:

english

File:

PDF, 1.42 MB

english, 2008

47

New nist-certified small scale pitch standard

Journal:

Computer Standards & Interfaces

Year:

1999

Language:

english

File:

PDF, 41 KB

english, 1999

48

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Accuracy differences among photomask metrology tools and why they matter

Potzick, James E., Grenon, Brian J., Abboud, Frank E.

Year:

1998

Language:

english

File:

PDF, 1.06 MB

english, 1998

49

ac-dc Regulator-Modulator

Year:

1968

Language:

english

File:

PDF, 391 KB

english, 1968

50

New Impedance Method for Determining Viscoelastic Constants

Spitznagel, Edward L., Potzick, James E., Catanese, Carmen A.

Journal:

Review of Scientific Instruments

Year:

1964

Language:

english

File:

PDF, 680 KB

english, 1964

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@z-lib.do

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски